Polymer blend lithography: A versatile method to fabricate nanopatterned self-assembled monolayers

Polymer blend lithography: A versatile method to fabricate nanopatterned self-assembled monolayers

A rapid and cost-effective lithographic method, polymer blend lithography (PBL), is reported to produce patterned self-assembled monolayers (SAM) on solid substrates featuring two or three different chemical functionalities. For the pattern generation we use the phase separation of two immiscible po...

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Bibliographic Details
Main Authors: Cheng Huang, Markus Moosmann, Jiehong Jin, Tobias Heiler, Stefan Walheim, Thomas Schimmel
Format: Article
Language:English
Published: Beilstein-Institut 2012-09-01
Series:Beilstein Journal of Nanotechnology
Subjects:
breath figure
nanopatterned template
polymer blend lithography (PBL)
self-assembled monolayer (SAM)
self assembly
spin coating
vapor phase
Online Access:https://doi.org/10.3762/bjnano.3.71

Internet

https://doi.org/10.3762/bjnano.3.71

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