Evolution of nanoripples on silicon by gas cluster-ion irradiation
Si wafers of (100), (110) and (111) orientations were bombarded by gas cluster ion beam (GCIB) of 3000 Ar-atoms/cluster on average at a series of angles. Similar surface morphology ripples developed in different nanoscales. A simple scaling functional satisfactorily describe the roughness and wavele...
Main Authors: | , , , , , , , , , , |
---|---|
Format: | Article |
Language: | English |
Published: |
AIP Publishing LLC
2013-06-01
|
Series: | AIP Advances |
Online Access: | http://link.aip.org/link/doi/10.1063/1.4811171 |