Modelling of Optical Damage in Nanorippled ZnO Produced by Ion Irradiation

Modelling of Optical Damage in Nanorippled ZnO Produced by Ion Irradiation

Here, we report on the production of nanoripples on the surface of ZnO bulk substrates by ion beam erosion with 20 keV Ar<sup>+</sup> ions at an oblique incidence (60&#176;). The ripple patterns, analyzed by atomic force microscopy, follow a power law dependence for both the roughnes...

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Bibliographic Details
Main Authors: Andrés Redondo-Cubero, Luis Vázquez, Denis Jalabert, Katharina Lorenz, Nebiha Ben Sedrine
Format: Article
Language:English
Published: MDPI AG 2019-08-01
Series:Crystals
Subjects:
ZnO
patterning
sputtering
spectroscopic ellipsometry
ripples
damage
Online Access:https://www.mdpi.com/2073-4352/9/9/453

Internet

https://www.mdpi.com/2073-4352/9/9/453

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