Effect of anisotropy on deformation and crack formation under the brittle removal of 6H-SiC during SPDT process

Introduction: Monocrystal SiC is representative of the third generation semiconductor materials, the efficient process technology of 6H-SiC wafer have always been a hot topic. Developing a SPDT processing method based on brittle removal mode with controllable surface/subsurface damage is an importan...

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Bibliographic Details
Main Authors: Binbin Meng, Chen Li
Format: Article
Language:English
Published: Elsevier 2024-02-01
Series:Journal of Advanced Research
Subjects:
Online Access:http://www.sciencedirect.com/science/article/pii/S2090123223001108