Effect of Selective Lateral Chromium Doping by RF Magnetron Sputtering on the Structural, and Opto-Electrical Properties of Nickel Oxide

Effect of Selective Lateral Chromium Doping by RF Magnetron Sputtering on the Structural, and Opto-Electrical Properties of Nickel Oxide

In this study, chromium (Cr)-doped nickel oxide (NiO) thin films were deposited by employing selective lateral doping of Cr in NiO by radio-frequency magnetron sputtering at different doping times ranging from 0 s (undoped) to 80 s. The structural, optical, and electrical properties of the resulting...

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Bibliographic Details
Main Authors: Mohammad Shah Jamal, Khan Sobayel, Halina Misran, Taskina Nasrin, Khaled Althubeiti, Hend I. Alkhammash, Md. Shahiduzzaman, Kamaruzzaman Sopian, Nowshad Amin, Md. Akhtaruzzaman
Format: Article
Language:English
Published: MDPI AG 2021-12-01
Series:Applied Sciences
Subjects:
RF magnetron sputtering
selective lateral doping
NiO
thin film
doping time
microstructural defect
Online Access:https://www.mdpi.com/2076-3417/11/23/11546

Internet

https://www.mdpi.com/2076-3417/11/23/11546

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