Effect of SiNx diffusion barrier thickness on the structural properties and photocatalytic activity of TiO2 films obtained by sol–gel dip coating and reactive magnetron sputtering

Effect of SiNx diffusion barrier thickness on the structural properties and photocatalytic activity of TiO2 films obtained by sol–gel dip coating and reactive magnetron sputtering

We investigate the effect of the thickness of the silicon nitride (SiNx) diffusion barrier on the structural and photocatalytic efficiency of TiO2 films obtained with different processes. We show that the structural and photocatalytic efficiency of TiO2 films produced using soft chemistry (sol–gel)...

Full description

Bibliographic Details
Main Authors: Mohamed Nawfal Ghazzal, Eric Aubry, Nouari Chaoui, Didier Robert
Format: Article
Language:English
Published: Beilstein-Institut 2015-10-01
Series:Beilstein Journal of Nanotechnology
Subjects:
diffusion barrier
photocatalysis
reactive sputtering
SiNx
sol–gel
titanium dioxide film
TiO2
Online Access:https://doi.org/10.3762/bjnano.6.207

Internet

https://doi.org/10.3762/bjnano.6.207

Similar Items