Low Temperature Growth of In<sub>2</sub>O<sub>3</sub>and InN Nanocrystals on Si(111) via Chemical Vapour Deposition Based on the Sublimation of NH<sub>4</sub>Cl in In

Low Temperature Growth of In<sub>2</sub>O<sub>3</sub>and InN Nanocrystals on Si(111) via Chemical Vapour Deposition Based on the Sublimation of NH<sub>4</sub>Cl in In

<p>Abstract</p> <p>Indium oxide (In<sub>2</sub>O<sub>3</sub>) nanocrystals (NCs) have been obtained via atmospheric pressure, chemical vapour deposition (APCVD) on Si(111) via the direct oxidation of In with Ar:10% O<sub>2</sub>at 1000 &#176;...

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Bibliographic Details
Main Authors: Tsokkou Demetra, Othonos Andreas, Zervos Matthew, Pervolaraki Maria
Format: Article
Language:English
Published: SpringerOpen 2009-01-01
Series:Nanoscale Research Letters
Subjects:
Indium oxide
Indium nitride
Nanocrystals
Low temperature
Chemical vapour deposition
Online Access:http://dx.doi.org/10.1007/s11671-009-9266-1

Internet

http://dx.doi.org/10.1007/s11671-009-9266-1

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