Study of Exposure Uniformity of UV LED Exposure System for Wafer-Level Camera Lenses
Wafer-level camera lenses are a very promising process for camera lens fabrication. However, there exist some problems with this technology, such as uneven exposure due to curing non-uniformities. In this study, an optical simulation was implemented to simulate the UV light-emitting diodes (LEDs) cu...
| Main Authors: | , , |
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| Format: | Article |
| Language: | English |
| Published: |
MDPI AG
2019-10-01
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| Series: | Applied Sciences |
| Subjects: | |
| Online Access: | https://www.mdpi.com/2076-3417/9/19/4110 |