Synthesis and Characterization of Boron Nitride Thin Films Deposited by High-Power Impulse Reactive Magnetron Sputtering

In the present research, hexagonal boron nitride (h-BN) films were deposited by reactive high-power impulse magnetron sputtering (HiPIMS) of the pure boron target. Nitrogen was used as both a sputtering gas and a reactive gas. It was shown that, using only nitrogen gas, hexagonal-boron-phase thin fi...

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Bibliographic Details
Main Authors: Vytautas Stankus, Andrius Vasiliauskas, Asta Guobienė, Mindaugas Andrulevičius, Šarūnas Meškinis
Format: Article
Language:English
Published: MDPI AG 2024-11-01
Series:Molecules
Subjects:
Online Access:https://www.mdpi.com/1420-3049/29/22/5247