Photoresist-enabled assembly of BN/graphene/BN heterostructure and fabrication of one-dimensional contact electrode

Photoresist-enabled assembly of BN/graphene/BN heterostructure and fabrication of one-dimensional contact electrode

A poly(methyl methacrylate) (PMMA) substrate is easily soluble in acetone and cannot withstand high temperatures, thereby restricting the application of graphene or boron nitride (BN) on it. Furthermore, the assembly mechanism of a BN/graphene/BN heterostructure directly determines the performance o...

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Bibliographic Details
Main Authors: Anjiang Cai, Wang Yu, Guodong Zhang, Yulong Zhao, Jing Sun, Yuan Liu, Dongpeng Zhang
Format: Article
Language:English
Published: IOP Publishing 2020-01-01
Series:Materials Research Express
Subjects:
BN/graphene/BN heterostructure
PMMA substrates
photoresist
stacking transfer assembly
exposure on the back of surface sustrate
one-dimensional contact
Online Access:https://doi.org/10.1088/2053-1591/abc71c

Internet

https://doi.org/10.1088/2053-1591/abc71c

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