Enhancement of Ar Ion Flux on the Substrate by Heterogeneous Charge Transfer Collision of Ar Atom with He Ion in an Inductively Coupled Ar/He Plasma

The understanding of ion dynamics in plasma applications has received significant attention. In this study, we examined these effects between He and Ar species, focusing on the Ar ion flux on the substrate. To control heterogeneous collisions, we varied the He addition rate at fixed chamber pressure...

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Bibliographic Details
Main Authors: Inho Seong, Sijun Kim, Minsu Choi, Woobeen Lee, Wonnyoung Jeong, Chulhee Cho, Yebin You, Youngseok Lee, Youbin Seol, Shinjae You
Format: Article
Language:English
Published: MDPI AG 2023-08-01
Series:Materials
Subjects:
Online Access:https://www.mdpi.com/1996-1944/16/17/5746