Exploiting rotational asymmetry for sub-50 nm mechanical nanocalligraphy

Abstract Nanofabrication has experienced extraordinary progress in the area of lithography-led processes over the last decades, although versatile and adaptable techniques addressing a wide spectrum of materials are still nascent. Scanning probe lithography (SPL) offers the capability to readily pat...

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Bibliographic Details
Main Authors: Nikolaos Farmakidis, Jacob L. Swett, Nathan Youngblood, Xuan Li, Charalambos Evangeli, Samarth Aggarwal, Jan A. Mol, Harish Bhaskaran
Format: Article
Language:English
Published: Nature Publishing Group 2021-10-01
Series:Microsystems & Nanoengineering
Online Access:https://doi.org/10.1038/s41378-021-00300-y