Low-temperature plasma magnetron discharge
The article investigates a low-temperature plasma of the magnetron discharge of a device used for the synthesis of dielectric films by reactive cathode sputtering. The aim of the study is to determine the temperature characteristics of plasma particles and a sputtered substance, as well as the mecha...
| Egile Nagusiak: | , , , |
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| Formatua: | Artikulua |
| Hizkuntza: | Russian |
| Argitaratua: |
Educational institution «Belarusian State University of Informatics and Radioelectronics»
2019-06-01
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| Saila: | Doklady Belorusskogo gosudarstvennogo universiteta informatiki i radioèlektroniki |
| Gaiak: | |
| Sarrera elektronikoa: | https://doklady.bsuir.by/jour/article/view/1138 |