Low-temperature plasma magnetron discharge

Low-temperature plasma magnetron discharge

The article investigates a low-temperature plasma of the magnetron discharge of a device used for the synthesis of dielectric films by reactive cathode sputtering. The aim of the study is to determine the temperature characteristics of plasma particles and a sputtered substance, as well as the mecha...

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Bibliographic Details
Main Authors: I. Sh. Nevliudov, D. V. Gurin, V. N. Gurin, K. L. Khrustalev
Format: Article
Language:Russian
Published: Educational institution «Belarusian State University of Informatics and Radioelectronics» 2019-06-01
Series:Doklady Belorusskogo gosudarstvennogo universiteta informatiki i radioèlektroniki
Subjects:
magnetron chamber
mass spectrometry
nitrogen plasma
atomization
argon plasma
Online Access:https://doklady.bsuir.by/jour/article/view/1138

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