X‐Ray Multibeam Ptychography at up to 20 keV: Nano‐Lithography Enhances X‐Ray Nano‐Imaging

X‐Ray Multibeam Ptychography at up to 20 keV: Nano‐Lithography Enhances X‐Ray Nano‐Imaging

Abstract Hard X‐rays are needed for non‐destructive nano‐imaging of solid matter. Synchrotron radiation facilities (SRF) provide the highest‐quality images with single‐digit nm resolution using advanced techniques such as X‐ray ptychography. However, the resolution or field of view is ultimately con...

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Bibliographic Details
Main Authors: Tang Li, Maik Kahnt, Thomas L. Sheppard, Runqing Yang, Ken V. Falch, Roman Zvagelsky, Pablo Villanueva‐Perez, Martin Wegener, Mikhail Lyubomirskiy
Format: Article
Language:English
Published: Wiley 2024-08-01
Series:Advanced Science
Subjects:
lens‐less imaging
microscopy
nano‐lithography
ptychography
Online Access:https://doi.org/10.1002/advs.202310075

Internet

https://doi.org/10.1002/advs.202310075

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