The straightforward fabrication of thin silicide layers at low temperatures by employing the molecular-incident reaction effect

Because of the ease of formation, and good lattice match with Si, metal silicides often form high-quality epitaxial layers and have established themselves over the years as important technological materials with industrial applications. For the fabrication of silicon-based devices, the contact betwe...

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Bibliographic Details
Main Authors: Cheng-Hsun-Tony Chang, Yu-Ting Chow, Pei-Cheng Jiang, Tsu-Yi Fu, Jyh-Shen Tsay
Format: Article
Language:English
Published: Elsevier 2022-08-01
Series:Results in Physics
Subjects:
Online Access:http://www.sciencedirect.com/science/article/pii/S2211379722004442