A Three-Dimensional DRAM Using Floating Body Capacitance Cells in an FD-SOI Process
This paper describes a three- dimensional DRAM in which the floating body capacitance (FBC) of a fully depleted SOI (FD-SOI) device is used as a storage node. This 1T DRAM lends itself particularly well to a 3D wafer-to-wafer bonding process because of the absence of deep etched and filled trench ca...
Main Authors: | , |
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Format: | Article |
Language: | English |
Published: |
Spolecnost pro radioelektronicke inzenyrstvi
2013-12-01
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Series: | Radioengineering |
Subjects: | |
Online Access: | http://www.radioeng.cz/fulltexts/2013/13_04_0975_0984.pdf |