Optimizing SiGe–SiO2 Visible–Short‐Wave Infrared Photoresponse by Modulating Interplay Between Strain and Defects Through Annealing
SiGe‐SiO2‐based structures present high interest for their high photosensitivity from visible to short‐wavelength infrared. Herein, two postdeposition annealing procedures, that is, rapid thermal annealing (RTA) and rapid‐like furnace annealing (FA), are compared. Both RTA and FA are performed at 60...
主要な著者: | , , , , , , , |
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フォーマット: | 論文 |
言語: | English |
出版事項: |
Wiley-VCH
2024-08-01
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シリーズ: | Advanced Photonics Research |
主題: | |
オンライン・アクセス: | https://doi.org/10.1002/adpr.202300316 |