Lithography for robust and editable atomic-scale silicon devices and memories

Lithography for robust and editable atomic-scale silicon devices and memories

Manipulation at the atomic scale comes with a trade-off between simplicity and thermal stability. Here, Achal et al. demonstrate improved automated hydrogen lithography and repassivation, enabling error-corrected atomic writing of large-scale structures/memories that are stable at room temperature.

Bibliographic Details
Main Authors: Roshan Achal, Mohammad Rashidi, Jeremiah Croshaw, David Churchill, Marco Taucer, Taleana Huff, Martin Cloutier, Jason Pitters, Robert A. Wolkow
Format: Article
Language:English
Published: Nature Portfolio 2018-07-01
Series:Nature Communications
Online Access:https://doi.org/10.1038/s41467-018-05171-y

Internet

https://doi.org/10.1038/s41467-018-05171-y

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