Optimised magnetron sputtering method for the deposition of indium tin oxide layers

Optimised magnetron sputtering method for the deposition of indium tin oxide layers

The article presents the method of magnetron sputtering for the deposition of conductive emitter coatings in semiconductor structures. The layers were applied to a silicon substrate. For optical investigations, borosilicate glasses were used. The obtained layers were subjected to both optical and el...

Full description

Bibliographic Details
Main Authors: Małgorzata Musztyfaga-Staszuk, Dušan Pudiš, Robert Socha, Katarzyna Gawlińska-Nęcek, Piotr Panek
Format: Article
Language:English
Published: Polish Academy of Sciences 2021-11-01
Series:Bulletin of the Polish Academy of Sciences: Technical Sciences
Subjects:
in₂o₃
sn₂o
ito
magnetron sputtering method
Online Access:https://journals.pan.pl/Content/121318/PDF/Z_29_02431_Bpast.No.69(6)_OK.pdf

Similar Items

Similar Items