Properties of Metallic and Oxide Thin Films Based on Ti and Co Prepared by Magnetron Sputtering from Sintered Targets with Different Co-Content

Properties of Metallic and Oxide Thin Films Based on Ti and Co Prepared by Magnetron Sputtering from Sintered Targets with Different Co-Content

In this work, selected properties of metallic and oxide thin films based on titanium and cobalt were described. Thin-film coatings were prepared using the magnetron sputtering method. The deposition was carried out from sintered targets with different Co-content (2 at.%, 12 at.% and 50 at.%). The re...

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Bibliographic Details
Main Authors: Damian Wojcieszak, Michał Mazur, Patrycja Pokora, Adriana Wrona, Katarzyna Bilewska, Wojciech Kijaszek, Tomasz Kotwica, Witold Posadowski, Jarosław Domaradzki
Format: Article
Language:English
Published: MDPI AG 2021-07-01
Series:Materials
Subjects:
amorphous thin film
magnetron sputtering
titanium
cobalt
memristive-like effect
transparent electronics
Online Access:https://www.mdpi.com/1996-1944/14/14/3797

Internet

https://www.mdpi.com/1996-1944/14/14/3797

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