Method of Ga removal from a specimen on a microelectromechanical system-based chip for in-situ transmission electron microscopy

Method of Ga removal from a specimen on a microelectromechanical system-based chip for in-situ transmission electron microscopy

Abstract In-situ transmission electron microscopy (TEM) holders that employ a chip-type specimen stage have been widely utilized in recent years. The specimen on the microelectromechanical system (MEMS)-based chip is commonly prepared by focused ion beam (FIB) milling and ex-situ lift-out (EXLO). Ho...

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Bibliographic Details
Main Authors: Yena Kwon, Byeong-Seon An, Yeon-Ju Shin, Cheol-Woong Yang
Format: Article
Language:English
Published: SpringerOpen 2020-10-01
Series:Applied Microscopy
Subjects:
Focused ion beam
Ex-situ lift-out system
Ga residue
MEMS-based chip
Ar+ ion milling
Online Access:https://doi.org/10.1186/s42649-020-00043-6

Internet

https://doi.org/10.1186/s42649-020-00043-6

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