Low Temperature Deposition of TiO<sub>2</sub> Thin Films through Atmospheric Pressure Plasma Jet Processing

Low Temperature Deposition of TiO<sub>2</sub> Thin Films through Atmospheric Pressure Plasma Jet Processing

Titanium dioxide (TiO<sub>2</sub>) has been widely used as a catalyst material in different applications such as photocatalysis, solar cells, supercapacitor, and hydrogen production, due to its better chemical stability, high redox potential, wide band gap, and eco-friendly nature. In th...

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Bibliographic Details
Main Authors: Suresh Gosavi, Rena Tabei, Nitish Roy, Sanjay S. Latthe, Yuvaraj M. Hunge, Norihiro Suzuki, Takeshi Kondo, Makoto Yuasa, Katsuya Teshima, Akira Fujishima, Chiaki Terashima
Format: Article
Language:English
Published: MDPI AG 2021-01-01
Series:Catalysts
Subjects:
atmospheric pressure plasma jet technique
TiO<sub>2</sub> thin films
photocatalytic
wettability
Online Access:https://www.mdpi.com/2073-4344/11/1/91

Internet

https://www.mdpi.com/2073-4344/11/1/91

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