Low Temperature Deposition of TiO<sub>2</sub> Thin Films through Atmospheric Pressure Plasma Jet Processing
Titanium dioxide (TiO<sub>2</sub>) has been widely used as a catalyst material in different applications such as photocatalysis, solar cells, supercapacitor, and hydrogen production, due to its better chemical stability, high redox potential, wide band gap, and eco-friendly nature. In th...
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MDPI AG
2021-01-01
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| Series: | Catalysts |
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| Online Access: | https://www.mdpi.com/2073-4344/11/1/91 |
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| author | Suresh Gosavi Rena Tabei Nitish Roy Sanjay S. Latthe Yuvaraj M. Hunge Norihiro Suzuki Takeshi Kondo Makoto Yuasa Katsuya Teshima Akira Fujishima Chiaki Terashima |
| author_facet | Suresh Gosavi Rena Tabei Nitish Roy Sanjay S. Latthe Yuvaraj M. Hunge Norihiro Suzuki Takeshi Kondo Makoto Yuasa Katsuya Teshima Akira Fujishima Chiaki Terashima |
| author_sort | Suresh Gosavi |
| collection | DOAJ |
| description | Titanium dioxide (TiO<sub>2</sub>) has been widely used as a catalyst material in different applications such as photocatalysis, solar cells, supercapacitor, and hydrogen production, due to its better chemical stability, high redox potential, wide band gap, and eco-friendly nature. In this work TiO<sub>2</sub> thin films have been deposited onto both glass and silicon substrates by the atmospheric pressure plasma jet (APPJ) technique. The structure and morphological properties of TiO<sub>2</sub> thin films are studied using different characterization techniques like X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS), Raman spectroscopy, and field emission scanning electron microscopy. XRD study reveals the bronze-phase of TiO<sub>2</sub>. The XPS study shows the presence of Ti, O, C, and N elements. The FE-SEM study shows the substrate surface is well covered with a nearly round shaped grain of different size. The optical study shows that all the deposited TiO<sub>2</sub> thin films exhibit strong absorption in the ultraviolet region. The oleic acid photocatalytic decomposition study demonstrates that the water contact angle decreased from 80.22 to 27.20° under ultraviolet illumination using a TiO<sub>2</sub> photocatalyst. |
| first_indexed | 2024-03-09T05:11:49Z |
| format | Article |
| id | doaj.art-3acd2c587107487bb4588a25fba42bf7 |
| institution | Directory Open Access Journal |
| issn | 2073-4344 |
| language | English |
| last_indexed | 2024-03-09T05:11:49Z |
| publishDate | 2021-01-01 |
| publisher | MDPI AG |
| record_format | Article |
| series | Catalysts |
| spelling | doaj.art-3acd2c587107487bb4588a25fba42bf72023-12-03T12:48:12ZengMDPI AGCatalysts2073-43442021-01-011119110.3390/catal11010091Low Temperature Deposition of TiO<sub>2</sub> Thin Films through Atmospheric Pressure Plasma Jet ProcessingSuresh Gosavi0Rena Tabei1Nitish Roy2Sanjay S. Latthe3Yuvaraj M. Hunge4Norihiro Suzuki5Takeshi Kondo6Makoto Yuasa7Katsuya Teshima8Akira Fujishima9Chiaki Terashima10Center for Advance Studies in Material Science and Solid State Physics, Department of Physics, Savitribai PhulePune University, (Formerly University of Pune), Pune 411007, IndiaFaculty of Science and Technology, Tokyo University of Science, 2641 Yamazaki, Noda, Chiba 278-8510, JapanPhotocatalysis International Research Center, Research Institute for Science and Technology, Tokyo University of Science, 2641 Yamazaki, Noda, Chiba 278-8510, JapanRaje Ramrao Mahavidyalaya, Jath 416404, IndiaPhotocatalysis International Research Center, Research Institute for Science and Technology, Tokyo University of Science, 2641 Yamazaki, Noda, Chiba 278-8510, JapanPhotocatalysis International Research Center, Research Institute for Science and Technology, Tokyo University of Science, 2641 Yamazaki, Noda, Chiba 278-8510, JapanPhotocatalysis International Research Center, Research Institute for Science and Technology, Tokyo University of Science, 2641 Yamazaki, Noda, Chiba 278-8510, JapanPhotocatalysis International Research Center, Research Institute for Science and Technology, Tokyo University of Science, 2641 Yamazaki, Noda, Chiba 278-8510, JapanResearch Center for Space Colony, Tokyo University of Science, 2641 Yamazaki, Noda, Chiba 278-8510, JapanPhotocatalysis International Research Center, Research Institute for Science and Technology, Tokyo University of Science, 2641 Yamazaki, Noda, Chiba 278-8510, JapanPhotocatalysis International Research Center, Research Institute for Science and Technology, Tokyo University of Science, 2641 Yamazaki, Noda, Chiba 278-8510, JapanTitanium dioxide (TiO<sub>2</sub>) has been widely used as a catalyst material in different applications such as photocatalysis, solar cells, supercapacitor, and hydrogen production, due to its better chemical stability, high redox potential, wide band gap, and eco-friendly nature. In this work TiO<sub>2</sub> thin films have been deposited onto both glass and silicon substrates by the atmospheric pressure plasma jet (APPJ) technique. The structure and morphological properties of TiO<sub>2</sub> thin films are studied using different characterization techniques like X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS), Raman spectroscopy, and field emission scanning electron microscopy. XRD study reveals the bronze-phase of TiO<sub>2</sub>. The XPS study shows the presence of Ti, O, C, and N elements. The FE-SEM study shows the substrate surface is well covered with a nearly round shaped grain of different size. The optical study shows that all the deposited TiO<sub>2</sub> thin films exhibit strong absorption in the ultraviolet region. The oleic acid photocatalytic decomposition study demonstrates that the water contact angle decreased from 80.22 to 27.20° under ultraviolet illumination using a TiO<sub>2</sub> photocatalyst.https://www.mdpi.com/2073-4344/11/1/91atmospheric pressure plasma jet techniqueTiO<sub>2</sub> thin filmsphotocatalyticwettability |
| spellingShingle | Suresh Gosavi Rena Tabei Nitish Roy Sanjay S. Latthe Yuvaraj M. Hunge Norihiro Suzuki Takeshi Kondo Makoto Yuasa Katsuya Teshima Akira Fujishima Chiaki Terashima Low Temperature Deposition of TiO<sub>2</sub> Thin Films through Atmospheric Pressure Plasma Jet Processing Catalysts atmospheric pressure plasma jet technique TiO<sub>2</sub> thin films photocatalytic wettability |
| title | Low Temperature Deposition of TiO<sub>2</sub> Thin Films through Atmospheric Pressure Plasma Jet Processing |
| title_full | Low Temperature Deposition of TiO<sub>2</sub> Thin Films through Atmospheric Pressure Plasma Jet Processing |
| title_fullStr | Low Temperature Deposition of TiO<sub>2</sub> Thin Films through Atmospheric Pressure Plasma Jet Processing |
| title_full_unstemmed | Low Temperature Deposition of TiO<sub>2</sub> Thin Films through Atmospheric Pressure Plasma Jet Processing |
| title_short | Low Temperature Deposition of TiO<sub>2</sub> Thin Films through Atmospheric Pressure Plasma Jet Processing |
| title_sort | low temperature deposition of tio sub 2 sub thin films through atmospheric pressure plasma jet processing |
| topic | atmospheric pressure plasma jet technique TiO<sub>2</sub> thin films photocatalytic wettability |
| url | https://www.mdpi.com/2073-4344/11/1/91 |
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