Dielectric Properties Investigation of Metal–Insulator–Metal (MIM) Capacitors

Dielectric Properties Investigation of Metal–Insulator–Metal (MIM) Capacitors

This study presents the construction and dielectric properties investigation of atomic-layer-deposition Al<sub>2</sub>O<sub>3</sub>/TiO<sub>2</sub>/HfO<sub>2</sub> dielectric-film-based metal–insulator–metal (MIM) capacitors. The influence of the diele...

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Bibliographic Details
Main Authors: Li Xiong, Jin Hu, Zhao Yang, Xianglin Li, Hang Zhang, Guanhua Zhang
Format: Article
Language:English
Published: MDPI AG 2022-06-01
Series:Molecules
Subjects:
energy storage
metal–insulator–metal capacitors
atomic layer deposition
laser direct writing
electrical performance
Online Access:https://www.mdpi.com/1420-3049/27/12/3951

Internet

https://www.mdpi.com/1420-3049/27/12/3951

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