Dielectric Properties Investigation of Metal–Insulator–Metal (MIM) Capacitors

Dielectric Properties Investigation of Metal–Insulator–Metal (MIM) Capacitors

This study presents the construction and dielectric properties investigation of atomic-layer-deposition Al<sub>2</sub>O<sub>3</sub>/TiO<sub>2</sub>/HfO<sub>2</sub> dielectric-film-based metal–insulator–metal (MIM) capacitors. The influence of the diele...

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Bibliographic Details
Main Authors:	Li Xiong, Jin Hu, Zhao Yang, Xianglin Li, Hang Zhang, Guanhua Zhang
Format:	Article
Language:	English
Published:	MDPI AG 2022-06-01
Series:	Molecules
Subjects:	energy storage metal–insulator–metal capacitors atomic layer deposition laser direct writing electrical performance
Online Access:	https://www.mdpi.com/1420-3049/27/12/3951

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