Logic-in-memory application of ferroelectric-based WS2-channel field-effect transistors for improved area and energy efficiency

Abstract In this study, we applied ferroelectrics to the gate stack of Field Effect Transistors (FETs) with a 2D transition-metal dichalcogenide (TMDC) channel, actively researching for sub-2nm technology node implementation. Subsequently, we analyzed the circuit characteristics of Logic-in-Memory (...

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Bibliographic Details
Main Authors: Huijun Kim, Juhwan Park, Hanggyo Jung, Changho Ra, Jongwook Jeon
Format: Article
Language:English
Published: Nature Portfolio 2024-04-01
Series:npj 2D Materials and Applications
Online Access:https://doi.org/10.1038/s41699-024-00466-9