Oxalic Acid-Induced Photodissolution of Ferrihydrite and the Fate of Loaded As(V): Kinetics and Mechanism
The fate of arsenic in the water environment is of great concern. Here, the influences of oxalic acid and UV light illumination on the dissolution of naked ferrihydrite (Fhy), Fhy loaded with As(V) [Fhy*-As(V)], as well as the fate of As(V) at pH 3.0 were studied. With the assistance of oxalic acid,...
| Main Authors: | , , , , , |
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| Format: | Article |
| Language: | English |
| Published: |
MDPI AG
2019-08-01
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| Series: | Nanomaterials |
| Subjects: | |
| Online Access: | https://www.mdpi.com/2079-4991/9/8/1143 |