Oxalic Acid-Induced Photodissolution of Ferrihydrite and the Fate of Loaded As(V): Kinetics and Mechanism
The fate of arsenic in the water environment is of great concern. Here, the influences of oxalic acid and UV light illumination on the dissolution of naked ferrihydrite (Fhy), Fhy loaded with As(V) [Fhy*-As(V)], as well as the fate of As(V) at pH 3.0 were studied. With the assistance of oxalic acid,...
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MDPI AG
2019-08-01
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| Series: | Nanomaterials |
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| Online Access: | https://www.mdpi.com/2079-4991/9/8/1143 |
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| author | Hai-Tao Ren Jing Han Ting-Ting Li Qi Lin Jia-Horng Lin Ching-Wen Lou |
| author_facet | Hai-Tao Ren Jing Han Ting-Ting Li Qi Lin Jia-Horng Lin Ching-Wen Lou |
| author_sort | Hai-Tao Ren |
| collection | DOAJ |
| description | The fate of arsenic in the water environment is of great concern. Here, the influences of oxalic acid and UV light illumination on the dissolution of naked ferrihydrite (Fhy), Fhy loaded with As(V) [Fhy*-As(V)], as well as the fate of As(V) at pH 3.0 were studied. With the assistance of oxalic acid, complexes of Fe(III)-oxalic acid produced on Fhy/Fhy*-As(V) were reduced to Fe(II)-oxalic acid by photo-induced electrons under UV light irradiation. UV light has nearly no impact on the release of As(V) in the system of Fhy*-As(V) without the assistance of oxalic acid. Nevertheless, in the existence of oxalic acid, UV light illumination resulted in the contents of liberated As(V) decreased by 775−1300% compared to that without light. Considering the coexistence of As(V), oxalic acid as well as iron oxides in aquatic environments, the present study revealed that UV illumination could enhance the retention of As(V) on Fhy in the acidic water environment containing oxalic acid. |
| first_indexed | 2024-12-22T09:27:22Z |
| format | Article |
| id | doaj.art-3c04292fc8764e19974cc855b620972f |
| institution | Directory Open Access Journal |
| issn | 2079-4991 |
| language | English |
| last_indexed | 2024-12-22T09:27:22Z |
| publishDate | 2019-08-01 |
| publisher | MDPI AG |
| record_format | Article |
| series | Nanomaterials |
| spelling | doaj.art-3c04292fc8764e19974cc855b620972f2022-12-21T18:31:03ZengMDPI AGNanomaterials2079-49912019-08-0198114310.3390/nano9081143nano9081143Oxalic Acid-Induced Photodissolution of Ferrihydrite and the Fate of Loaded As(V): Kinetics and MechanismHai-Tao Ren0Jing Han1Ting-Ting Li2Qi Lin3Jia-Horng Lin4Ching-Wen Lou5Innovation Platform of Intelligent and Energy-Saving Textiles, School of Textile Science and Engineering, Tianjin Polytechnic University, Tianjin 300387, ChinaInnovation Platform of Intelligent and Energy-Saving Textiles, School of Textile Science and Engineering, Tianjin Polytechnic University, Tianjin 300387, ChinaInnovation Platform of Intelligent and Energy-Saving Textiles, School of Textile Science and Engineering, Tianjin Polytechnic University, Tianjin 300387, ChinaFujian Engineering Research Center of New Chinese Lacquer Material, Minjiang University, Fuzhou 350108, ChinaInnovation Platform of Intelligent and Energy-Saving Textiles, School of Textile Science and Engineering, Tianjin Polytechnic University, Tianjin 300387, ChinaFujian Key Laboratory of Novel Functional Fibers and Materials, Minjiang University, Fuzhou 350108, ChinaThe fate of arsenic in the water environment is of great concern. Here, the influences of oxalic acid and UV light illumination on the dissolution of naked ferrihydrite (Fhy), Fhy loaded with As(V) [Fhy*-As(V)], as well as the fate of As(V) at pH 3.0 were studied. With the assistance of oxalic acid, complexes of Fe(III)-oxalic acid produced on Fhy/Fhy*-As(V) were reduced to Fe(II)-oxalic acid by photo-induced electrons under UV light irradiation. UV light has nearly no impact on the release of As(V) in the system of Fhy*-As(V) without the assistance of oxalic acid. Nevertheless, in the existence of oxalic acid, UV light illumination resulted in the contents of liberated As(V) decreased by 775−1300% compared to that without light. Considering the coexistence of As(V), oxalic acid as well as iron oxides in aquatic environments, the present study revealed that UV illumination could enhance the retention of As(V) on Fhy in the acidic water environment containing oxalic acid.https://www.mdpi.com/2079-4991/9/8/1143ferrihydriteAs(V)photodissolutionoxalic acidfate |
| spellingShingle | Hai-Tao Ren Jing Han Ting-Ting Li Qi Lin Jia-Horng Lin Ching-Wen Lou Oxalic Acid-Induced Photodissolution of Ferrihydrite and the Fate of Loaded As(V): Kinetics and Mechanism Nanomaterials ferrihydrite As(V) photodissolution oxalic acid fate |
| title | Oxalic Acid-Induced Photodissolution of Ferrihydrite and the Fate of Loaded As(V): Kinetics and Mechanism |
| title_full | Oxalic Acid-Induced Photodissolution of Ferrihydrite and the Fate of Loaded As(V): Kinetics and Mechanism |
| title_fullStr | Oxalic Acid-Induced Photodissolution of Ferrihydrite and the Fate of Loaded As(V): Kinetics and Mechanism |
| title_full_unstemmed | Oxalic Acid-Induced Photodissolution of Ferrihydrite and the Fate of Loaded As(V): Kinetics and Mechanism |
| title_short | Oxalic Acid-Induced Photodissolution of Ferrihydrite and the Fate of Loaded As(V): Kinetics and Mechanism |
| title_sort | oxalic acid induced photodissolution of ferrihydrite and the fate of loaded as v kinetics and mechanism |
| topic | ferrihydrite As(V) photodissolution oxalic acid fate |
| url | https://www.mdpi.com/2079-4991/9/8/1143 |
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