Influence of Different Post Porosification Cleaning Steps on the Parameters of Porous Silicon Layer Stack
To grow a defect-free epitaxial silicon wafer (EpiWafer) on a reorganized porous silicon layer stack, the surface must be closed, smooth and particle-free. A post-porosification cleaning step prior to reorganization should significantly reduce the density of (metallic) particles on the surface. In...
Main Authors: | , , , , |
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Format: | Article |
Language: | English |
Published: |
TIB Open Publishing
2024-02-01
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Series: | SiliconPV Conference Proceedings |
Subjects: | |
Online Access: | https://www.tib-op.org/ojs/index.php/siliconpv/article/view/882 |