Statistically Inspired Passivity Preserving Model Order Reduction

The continuous scaling of the on-chip devices and interconnects increases the complexity of the design space and becomes a crucial factor in the fabrication of modern integrated circuits. The ever decreasing of interconnect pitch along with process enhancement into the nanometer regime had shifted t...

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Bibliographic Details
Main Authors: Namra Akram, Mehboob Alam, Rashida Hussain, Yehia Massoud
Format: Article
Language:English
Published: IEEE 2023-01-01
Series:IEEE Access
Subjects:
Online Access:https://ieeexplore.ieee.org/document/10132456/