Statistically Inspired Passivity Preserving Model Order Reduction
The continuous scaling of the on-chip devices and interconnects increases the complexity of the design space and becomes a crucial factor in the fabrication of modern integrated circuits. The ever decreasing of interconnect pitch along with process enhancement into the nanometer regime had shifted t...
Main Authors: | , , , |
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Format: | Article |
Language: | English |
Published: |
IEEE
2023-01-01
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Series: | IEEE Access |
Subjects: | |
Online Access: | https://ieeexplore.ieee.org/document/10132456/ |