CMOS-Compatible Ultrathin Superconducting NbN Thin Films Deposited by Reactive Ion Sputtering on 300 mm Si Wafer

CMOS-Compatible Ultrathin Superconducting NbN Thin Films Deposited by Reactive Ion Sputtering on 300 mm Si Wafer

We report a milestone in achieving large-scale, ultrathin (~5 nm) superconducting NbN thin films on 300 mm Si wafers using a high-volume manufacturing (HVM) industrial physical vapor deposition (PVD) system. The NbN thin films possess remarkable structural uniformity and consistently high supercondu...

Full description

Bibliographic Details
Main Authors: Zihao Yang, Xiucheng Wei, Pinku Roy, Di Zhang, Ping Lu, Samyak Dhole, Haiyan Wang, Nicholas Cucciniello, Nag Patibandla, Zhebo Chen, Hao Zeng, Quanxi Jia, Mingwei Zhu
Format: Article
Language:English
Published: MDPI AG 2023-11-01
Series:Materials
Subjects:
ultrathin superconducting film
NbN
physical vapor deposition
Online Access:https://www.mdpi.com/1996-1944/16/23/7468

Internet

https://www.mdpi.com/1996-1944/16/23/7468

Similar Items