Electric-driven flexible-roller nanoimprint lithography on the stress-sensitive warped wafer
Surface nanopatterning of semiconductor optoelectronic devices is a powerful way to improve their quality and performance. However, photoelectric devices’ inherent stress sensitivity and inevitable warpage pose a huge challenge on fabricating nanostructures large-scale. Electric-driven flexible-roll...
| Main Authors: | , , , , , , , , |
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| Format: | Article |
| Language: | English |
| Published: |
IOP Publishing
2023-01-01
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| Series: | International Journal of Extreme Manufacturing |
| Subjects: | |
| Online Access: | https://doi.org/10.1088/2631-7990/acd827 |
| _version_ | 1827935348914651136 |
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| author | Yu Fan Chunhui Wang Jiaxing Sun Xiaogang Peng Hongmiao Tian Xiangming Li Xiaoliang Chen Xiaoming Chen Jinyou Shao |
| author_facet | Yu Fan Chunhui Wang Jiaxing Sun Xiaogang Peng Hongmiao Tian Xiangming Li Xiaoliang Chen Xiaoming Chen Jinyou Shao |
| author_sort | Yu Fan |
| collection | DOAJ |
| description | Surface nanopatterning of semiconductor optoelectronic devices is a powerful way to improve their quality and performance. However, photoelectric devices’ inherent stress sensitivity and inevitable warpage pose a huge challenge on fabricating nanostructures large-scale. Electric-driven flexible-roller nanoimprint lithography for nanopatterning the optoelectronic wafer is proposed in this study. The flexible nanoimprint template twining around a roller is continuously released and recovered, controlled by the roller’s simple motion. The electric field applied to the template and substrate provides the driving force. The contact line of the template and the substrate gradually moves with the roller to enable scanning and adapting to the entire warped substrate, under the electric field. In addition, the driving force generated from electric field is applied to the surface of substrate, so that the substrate is free from external pressure. Furthermore, liquid resist completely fills in microcavities on the template by powerful electric field force, to ensure the fidelity of the nanostructures. The proposed nanoimprint technology is validated on the prototype. Finally, nano-grating structures are fabricated on a gallium nitride light-emitting diode chip adopting the solution, achieving polarization of the light source. |
| first_indexed | 2024-03-13T07:53:53Z |
| format | Article |
| id | doaj.art-3d42bbb0f31d4a82ac03aecd692b6bc9 |
| institution | Directory Open Access Journal |
| issn | 2631-7990 |
| language | English |
| last_indexed | 2024-03-13T07:53:53Z |
| publishDate | 2023-01-01 |
| publisher | IOP Publishing |
| record_format | Article |
| series | International Journal of Extreme Manufacturing |
| spelling | doaj.art-3d42bbb0f31d4a82ac03aecd692b6bc92023-06-02T08:06:02ZengIOP PublishingInternational Journal of Extreme Manufacturing2631-79902023-01-015303510110.1088/2631-7990/acd827Electric-driven flexible-roller nanoimprint lithography on the stress-sensitive warped waferYu Fan0Chunhui Wang1Jiaxing Sun2Xiaogang Peng3Hongmiao Tian4Xiangming Li5Xiaoliang Chen6Xiaoming Chen7Jinyou Shao8https://orcid.org/0000-0003-2525-4587Micro- and Nano-technology Research Center, State Key Laboratory for Manufacturing Systems Engineering, Xi’an Jiaotong University , Xi’an 710049, People’s Republic of China; Frontier Institute of Science and Technology (FIST), Xi’an Jiaotong University , Xi’an 710049, People’s Republic of ChinaMicro- and Nano-technology Research Center, State Key Laboratory for Manufacturing Systems Engineering, Xi’an Jiaotong University , Xi’an 710049, People’s Republic of ChinaMicro- and Nano-technology Research Center, State Key Laboratory for Manufacturing Systems Engineering, Xi’an Jiaotong University , Xi’an 710049, People’s Republic of ChinaMicro- and Nano-technology Research Center, State Key Laboratory for Manufacturing Systems Engineering, Xi’an Jiaotong University , Xi’an 710049, People’s Republic of ChinaMicro- and Nano-technology Research Center, State Key Laboratory for Manufacturing Systems Engineering, Xi’an Jiaotong University , Xi’an 710049, People’s Republic of ChinaMicro- and Nano-technology Research Center, State Key Laboratory for Manufacturing Systems Engineering, Xi’an Jiaotong University , Xi’an 710049, People’s Republic of China; Frontier Institute of Science and Technology (FIST), Xi’an Jiaotong University , Xi’an 710049, People’s Republic of ChinaMicro- and Nano-technology Research Center, State Key Laboratory for Manufacturing Systems Engineering, Xi’an Jiaotong University , Xi’an 710049, People’s Republic of China; Frontier Institute of Science and Technology (FIST), Xi’an Jiaotong University , Xi’an 710049, People’s Republic of ChinaMicro- and Nano-technology Research Center, State Key Laboratory for Manufacturing Systems Engineering, Xi’an Jiaotong University , Xi’an 710049, People’s Republic of ChinaMicro- and Nano-technology Research Center, State Key Laboratory for Manufacturing Systems Engineering, Xi’an Jiaotong University , Xi’an 710049, People’s Republic of China; Frontier Institute of Science and Technology (FIST), Xi’an Jiaotong University , Xi’an 710049, People’s Republic of ChinaSurface nanopatterning of semiconductor optoelectronic devices is a powerful way to improve their quality and performance. However, photoelectric devices’ inherent stress sensitivity and inevitable warpage pose a huge challenge on fabricating nanostructures large-scale. Electric-driven flexible-roller nanoimprint lithography for nanopatterning the optoelectronic wafer is proposed in this study. The flexible nanoimprint template twining around a roller is continuously released and recovered, controlled by the roller’s simple motion. The electric field applied to the template and substrate provides the driving force. The contact line of the template and the substrate gradually moves with the roller to enable scanning and adapting to the entire warped substrate, under the electric field. In addition, the driving force generated from electric field is applied to the surface of substrate, so that the substrate is free from external pressure. Furthermore, liquid resist completely fills in microcavities on the template by powerful electric field force, to ensure the fidelity of the nanostructures. The proposed nanoimprint technology is validated on the prototype. Finally, nano-grating structures are fabricated on a gallium nitride light-emitting diode chip adopting the solution, achieving polarization of the light source.https://doi.org/10.1088/2631-7990/acd827nanoimprintingelectric-drivenflexible-rollerwarpedstress-sensitive |
| spellingShingle | Yu Fan Chunhui Wang Jiaxing Sun Xiaogang Peng Hongmiao Tian Xiangming Li Xiaoliang Chen Xiaoming Chen Jinyou Shao Electric-driven flexible-roller nanoimprint lithography on the stress-sensitive warped wafer International Journal of Extreme Manufacturing nanoimprinting electric-driven flexible-roller warped stress-sensitive |
| title | Electric-driven flexible-roller nanoimprint lithography on the stress-sensitive warped wafer |
| title_full | Electric-driven flexible-roller nanoimprint lithography on the stress-sensitive warped wafer |
| title_fullStr | Electric-driven flexible-roller nanoimprint lithography on the stress-sensitive warped wafer |
| title_full_unstemmed | Electric-driven flexible-roller nanoimprint lithography on the stress-sensitive warped wafer |
| title_short | Electric-driven flexible-roller nanoimprint lithography on the stress-sensitive warped wafer |
| title_sort | electric driven flexible roller nanoimprint lithography on the stress sensitive warped wafer |
| topic | nanoimprinting electric-driven flexible-roller warped stress-sensitive |
| url | https://doi.org/10.1088/2631-7990/acd827 |
| work_keys_str_mv | AT yufan electricdrivenflexiblerollernanoimprintlithographyonthestresssensitivewarpedwafer AT chunhuiwang electricdrivenflexiblerollernanoimprintlithographyonthestresssensitivewarpedwafer AT jiaxingsun electricdrivenflexiblerollernanoimprintlithographyonthestresssensitivewarpedwafer AT xiaogangpeng electricdrivenflexiblerollernanoimprintlithographyonthestresssensitivewarpedwafer AT hongmiaotian electricdrivenflexiblerollernanoimprintlithographyonthestresssensitivewarpedwafer AT xiangmingli electricdrivenflexiblerollernanoimprintlithographyonthestresssensitivewarpedwafer AT xiaoliangchen electricdrivenflexiblerollernanoimprintlithographyonthestresssensitivewarpedwafer AT xiaomingchen electricdrivenflexiblerollernanoimprintlithographyonthestresssensitivewarpedwafer AT jinyoushao electricdrivenflexiblerollernanoimprintlithographyonthestresssensitivewarpedwafer |