Characterization of TiCN thin films deposited by Dc-Pulsed PACVD using methane precursor

Characterization of TiCN thin films deposited by Dc-Pulsed PACVD using methane precursor

Titanium carbonitride (TiCN) thin films were deposited on hot-work steel (DIN 1.2606) by plasma-assisted chemical vapor deposition (PACVD) and the influence of different CH4/ (CH4+N2) gas flow ratio, on the layer mechanical properties, were investigated. SEM studies indicated that the growth rate is...

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Bibliographic Details
Main Authors: Seyed Mohammad Mahdi Shafiei, Mehdi Divandari, Seyed Mohammad Ali Boutorabi, Rahim Naghizadeh
Format: Article
Language:English
Published: Associação Brasileira de Metalurgia e Materiais (ABM); Associação Brasileira de Cerâmica (ABC); Associação Brasileira de Polímeros (ABPol) 2014-12-01
Series:Materials Research
Subjects:
PACVD
TiCN
tribology
thin film
Online Access:http://www.scielo.br/scielo.php?script=sci_arttext&pid=S1516-14392014000600037&tlng=en

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http://www.scielo.br/scielo.php?script=sci_arttext&pid=S1516-14392014000600037&tlng=en

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