Near-zero-adhesion-enabled intact wafer-scale resist-transfer printing for high-fidelity nanofabrication on arbitrary substrates

Near-zero-adhesion-enabled intact wafer-scale resist-transfer printing for high-fidelity nanofabrication on arbitrary substrates

There is an urgent need for novel processes that can integrate different functional nanostructures onto specific substrates, so as to meet the fast-growing need for broad applications in nanoelectronics, nanophotonics, and flexible optoelectronics. Existing direct-lithography methods are difficult t...

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Bibliographic Details
Main Authors: Zhiwen Shu, Bo Feng, Peng Liu, Lei Chen, Huikang Liang, Yiqin Chen, Jianwu Yu, Huigao Duan
Format: Article
Language:English
Published: IOP Publishing 2023-01-01
Series:International Journal of Extreme Manufacturing
Subjects:
resist-based transfer printing
near-zero adhesion
critical surface energy
wafer-scale nanofabrication
in situ fabrication
optoelectronic devices
Online Access:https://doi.org/10.1088/2631-7990/ad01fe

Internet

https://doi.org/10.1088/2631-7990/ad01fe

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