Graphite Pellicle: Physical Shield for Next‐Generation EUV Lithography Technology
Abstract Extreme ultraviolet lithography (EUVL) is widely employed in the electronics, automotive, military, and AI computing areas for IC chip fabrication. A pellicle is a thin and transparent membrane that protects a costly photomask, known as a reticle, during the EUVL process. The fabricated IC...
| Main Authors: | , , |
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| Format: | Article |
| Language: | English |
| Published: |
Wiley-VCH
2023-04-01
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| Series: | Advanced Materials Interfaces |
| Subjects: | |
| Online Access: | https://doi.org/10.1002/admi.202202489 |