Change with the Reactive Deposition Mode in Crystallographic and Mechanical Properties of Titanium Aluminum Nitride Coatings Obtained Via Grid-Assisted Magnetron Sputtering

Change with the Reactive Deposition Mode in Crystallographic and Mechanical Properties of Titanium Aluminum Nitride Coatings Obtained Via Grid-Assisted Magnetron Sputtering

Thin films of titanium aluminum nitride (Ti(1-x)AlxN) were deposited on silicon, copper, and plasma nitrided AISI D2 tool steel substrates through reactive direct current grid-assisted magnetron sputtering. The depositions were performed in the metal and compound modes using nitrogen flow rates of (...

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Bibliographic Details
Main Authors: Marcio Luiz Moretti, Julio Cesar Sagas, Abel Andre Candido Recco
Format: Article
Language:English
Published: Associação Brasileira de Metalurgia e Materiais (ABM); Associação Brasileira de Cerâmica (ABC); Associação Brasileira de Polímeros (ABPol) 2023-06-01
Series:Materials Research
Subjects:
Ti(1-x)AlxN
Grid-assisted magnetron sputtering
Reactive sputter deposition
Crystallographic orientation
Online Access:http://www.scielo.br/scielo.php?script=sci_arttext&pid=S1516-14392023000100274&tlng=en

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http://www.scielo.br/scielo.php?script=sci_arttext&pid=S1516-14392023000100274&tlng=en

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