Change with the Reactive Deposition Mode in Crystallographic and Mechanical Properties of Titanium Aluminum Nitride Coatings Obtained Via Grid-Assisted Magnetron Sputtering
Thin films of titanium aluminum nitride (Ti(1-x)AlxN) were deposited on silicon, copper, and plasma nitrided AISI D2 tool steel substrates through reactive direct current grid-assisted magnetron sputtering. The depositions were performed in the metal and compound modes using nitrogen flow rates of (...
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| Format: | Article |
| Language: | English |
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Associação Brasileira de Metalurgia e Materiais (ABM); Associação Brasileira de Cerâmica (ABC); Associação Brasileira de Polímeros (ABPol)
2023-06-01
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| Series: | Materials Research |
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| Online Access: | http://www.scielo.br/scielo.php?script=sci_arttext&pid=S1516-14392023000100274&tlng=en |
| _version_ | 1797788103855833088 |
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| author | Marcio Luiz Moretti Julio Cesar Sagas Abel Andre Candido Recco |
| author_facet | Marcio Luiz Moretti Julio Cesar Sagas Abel Andre Candido Recco |
| author_sort | Marcio Luiz Moretti |
| collection | DOAJ |
| description | Thin films of titanium aluminum nitride (Ti(1-x)AlxN) were deposited on silicon, copper, and plasma nitrided AISI D2 tool steel substrates through reactive direct current grid-assisted magnetron sputtering. The depositions were performed in the metal and compound modes using nitrogen flow rates of (7.2 ± 0.1) sccm and (6.8 ± 0.2) sccm, respectively. The relations between the process parameters and the crystallographic orientation were investigated. Chemical and mechanical properties were characterized by X-ray photoelectron spectroscopy (XPS), X-ray diffraction (XRD), scanning electron microscopy (SEM), transmission electron microscopy (TEM), and instrumented indentation technique (IIT). X-ray diffraction spectra and electron diffraction patterns revealed the presence of a Ti(1-x)AlxN phase with a face-centered cubic structure in both films. In metal mode, the coatings exhibited a preferential (111) plane orientation, changing to (200) in the compound mode. The change in preferential orientation was influenced by the reactive gas partial pressure. |
| first_indexed | 2024-03-13T01:30:51Z |
| format | Article |
| id | doaj.art-3fb8feda11c64305b0d98ba14ca27cf3 |
| institution | Directory Open Access Journal |
| issn | 1516-1439 |
| language | English |
| last_indexed | 2024-03-13T01:30:51Z |
| publishDate | 2023-06-01 |
| publisher | Associação Brasileira de Metalurgia e Materiais (ABM); Associação Brasileira de Cerâmica (ABC); Associação Brasileira de Polímeros (ABPol) |
| record_format | Article |
| series | Materials Research |
| spelling | doaj.art-3fb8feda11c64305b0d98ba14ca27cf32023-07-04T07:43:50ZengAssociação Brasileira de Metalurgia e Materiais (ABM); Associação Brasileira de Cerâmica (ABC); Associação Brasileira de Polímeros (ABPol)Materials Research1516-14392023-06-012610.1590/1980-5373-mr-2022-0500Change with the Reactive Deposition Mode in Crystallographic and Mechanical Properties of Titanium Aluminum Nitride Coatings Obtained Via Grid-Assisted Magnetron SputteringMarcio Luiz Morettihttps://orcid.org/0000-0001-6426-3633Julio Cesar SagasAbel Andre Candido Reccohttps://orcid.org/0000-0003-1420-1922Thin films of titanium aluminum nitride (Ti(1-x)AlxN) were deposited on silicon, copper, and plasma nitrided AISI D2 tool steel substrates through reactive direct current grid-assisted magnetron sputtering. The depositions were performed in the metal and compound modes using nitrogen flow rates of (7.2 ± 0.1) sccm and (6.8 ± 0.2) sccm, respectively. The relations between the process parameters and the crystallographic orientation were investigated. Chemical and mechanical properties were characterized by X-ray photoelectron spectroscopy (XPS), X-ray diffraction (XRD), scanning electron microscopy (SEM), transmission electron microscopy (TEM), and instrumented indentation technique (IIT). X-ray diffraction spectra and electron diffraction patterns revealed the presence of a Ti(1-x)AlxN phase with a face-centered cubic structure in both films. In metal mode, the coatings exhibited a preferential (111) plane orientation, changing to (200) in the compound mode. The change in preferential orientation was influenced by the reactive gas partial pressure.http://www.scielo.br/scielo.php?script=sci_arttext&pid=S1516-14392023000100274&tlng=enTi(1-x)AlxNGrid-assisted magnetron sputteringReactive sputter depositionCrystallographic orientation |
| spellingShingle | Marcio Luiz Moretti Julio Cesar Sagas Abel Andre Candido Recco Change with the Reactive Deposition Mode in Crystallographic and Mechanical Properties of Titanium Aluminum Nitride Coatings Obtained Via Grid-Assisted Magnetron Sputtering Materials Research Ti(1-x)AlxN Grid-assisted magnetron sputtering Reactive sputter deposition Crystallographic orientation |
| title | Change with the Reactive Deposition Mode in Crystallographic and Mechanical Properties of Titanium Aluminum Nitride Coatings Obtained Via Grid-Assisted Magnetron Sputtering |
| title_full | Change with the Reactive Deposition Mode in Crystallographic and Mechanical Properties of Titanium Aluminum Nitride Coatings Obtained Via Grid-Assisted Magnetron Sputtering |
| title_fullStr | Change with the Reactive Deposition Mode in Crystallographic and Mechanical Properties of Titanium Aluminum Nitride Coatings Obtained Via Grid-Assisted Magnetron Sputtering |
| title_full_unstemmed | Change with the Reactive Deposition Mode in Crystallographic and Mechanical Properties of Titanium Aluminum Nitride Coatings Obtained Via Grid-Assisted Magnetron Sputtering |
| title_short | Change with the Reactive Deposition Mode in Crystallographic and Mechanical Properties of Titanium Aluminum Nitride Coatings Obtained Via Grid-Assisted Magnetron Sputtering |
| title_sort | change with the reactive deposition mode in crystallographic and mechanical properties of titanium aluminum nitride coatings obtained via grid assisted magnetron sputtering |
| topic | Ti(1-x)AlxN Grid-assisted magnetron sputtering Reactive sputter deposition Crystallographic orientation |
| url | http://www.scielo.br/scielo.php?script=sci_arttext&pid=S1516-14392023000100274&tlng=en |
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