Fabrication of pyrolytic carbon interdigitated microelectrodes by maskless UV photolithography with epoxy-based photoresists SU-8 and mr-DWL

Fabrication of pyrolytic carbon interdigitated microelectrodes by maskless UV photolithography with epoxy-based photoresists SU-8 and mr-DWL

Maskless UV photolithography is increasingly used, especially in research environments where low turn-around time for new designs improves productivity. Here, we fabricate pyrolytic carbon interdigitated microelectrodes with small interelectrode gaps, good adhesion to the carrier substrate, high sur...

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Bibliographic Details
Main Authors: Nicolai Støvring, Babak Rezaei, Arto Heiskanen, Jenny Emnéus, Stephan Sylvest Keller
Format: Article
Language:English
Published: Elsevier 2024-06-01
Series:Micro and Nano Engineering
Subjects:
Maskless UV photolithography
Digital micromirror device
Pyrolytic carbon
Interdigitated electrodes
Polycrystalline Silicon adhesion structures
Cyclic voltammetry.
Online Access:http://www.sciencedirect.com/science/article/pii/S2590007224000200

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http://www.sciencedirect.com/science/article/pii/S2590007224000200

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