Growth of HfN thin films by reactive high power impulse magnetron sputtering
Thin hafnium nitride films were grown on SiO2 by reactive high power impulse magnetron sputtering (HiPIMS) and reactive direct current magnetron sputtering (dcMS). The conditions during growth were kept similar and the film properties were compared as growth temperature, nitrogen flow rate, and in t...
| Main Authors: | , |
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| Format: | Article |
| Language: | English |
| Published: |
AIP Publishing LLC
2018-03-01
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| Series: | AIP Advances |
| Online Access: | http://dx.doi.org/10.1063/1.5025553 |