Nanoscale waveguiding methods

<p>Abstract</p><p>While 32 nm lithography technology is on the horizon for integrated circuit (IC) fabrication, matching the pace for miniaturization with optics has been hampered by the diffraction limit. However, development of nanoscale components and guiding methods is burgeoni...

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Bibliographic Details
Main Authors: Wang Chia-Jean, Lin Lih
Format: Article
Language:English
Published: SpringerOpen 2007-01-01
Series:Nanoscale Research Letters
Subjects:
Online Access:http://dx.doi.org/10.1007/s11671-007-9056-6