EUROPIUM SILICATE THIN FILMS FABRICATED BY RF MAGNETRON SPUTTERING AND THERMAL TREATMENT

We report the fabrication and optical characteristics of europium silicate thin films. Layer structures of Eu2O3/SiOX/Si (100) were deposited by an rf-sputtering method and annealed at 1100°C by rapid thermal annealing (RTA). Two methods were used for the deposition of SiOX layer: One was deposited...

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Bibliographic Details
Main Authors: Young Chul Shin, Eun Hong Kim, Tae Geun Kim
Format: Article
Language:English
Published: Universiti Brunei Darussalam 2017-11-01
Series:ASEAN Journal on Science and Technology for Development
Subjects:
Online Access:http://www.ajstd.org/index.php/ajstd/article/view/195