EUROPIUM SILICATE THIN FILMS FABRICATED BY RF MAGNETRON SPUTTERING AND THERMAL TREATMENT
We report the fabrication and optical characteristics of europium silicate thin films. Layer structures of Eu2O3/SiOX/Si (100) were deposited by an rf-sputtering method and annealed at 1100°C by rapid thermal annealing (RTA). Two methods were used for the deposition of SiOX layer: One was deposited...
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| Format: | Article |
| Language: | English |
| Published: |
Universiti Brunei Darussalam
2017-11-01
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| Series: | ASEAN Journal on Science and Technology for Development |
| Subjects: | |
| Online Access: | http://www.ajstd.org/index.php/ajstd/article/view/195 |
| _version_ | 1797333072575725568 |
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| author | Young Chul Shin Eun Hong Kim Tae Geun Kim |
| author_facet | Young Chul Shin Eun Hong Kim Tae Geun Kim |
| author_sort | Young Chul Shin |
| collection | DOAJ |
| description | We report the fabrication and optical characteristics of europium silicate thin films. Layer structures of Eu2O3/SiOX/Si (100) were deposited by an rf-sputtering method and annealed at 1100°C by rapid thermal annealing (RTA). Two methods were used for the deposition of SiOX layer: One was deposited by sputtering using SiO2 target (Ar gas at a rate of 50 sccm) and the other was deposited by reactive sputtering using Si target (Ar gas at a rate of 45 sccm, with an O2 gas at a rate of 5 sccm). Photoluminescence peak at 430 nm was observed in the sample composed of SiOx interlayer sputtered from SiO2 target. In comparison, PL peak at 570 nm was observed in the other sample, the SiOx layer of which was deposited by reactive sputtering from Si target. The compositional distributions of these samples were analyzed by X-ray photoelectron spectroscopy (XPS). |
| first_indexed | 2024-03-08T07:58:32Z |
| format | Article |
| id | doaj.art-403efe891b0c4be6818ab93c3ea97152 |
| institution | Directory Open Access Journal |
| issn | 0217-5460 2224-9028 |
| language | English |
| last_indexed | 2024-03-08T07:58:32Z |
| publishDate | 2017-11-01 |
| publisher | Universiti Brunei Darussalam |
| record_format | Article |
| series | ASEAN Journal on Science and Technology for Development |
| spelling | doaj.art-403efe891b0c4be6818ab93c3ea971522024-02-02T12:49:56ZengUniversiti Brunei DarussalamASEAN Journal on Science and Technology for Development0217-54602224-90282017-11-01241&214715210.29037/ajstd.195190EUROPIUM SILICATE THIN FILMS FABRICATED BY RF MAGNETRON SPUTTERING AND THERMAL TREATMENTYoung Chul Shin0Eun Hong Kim1Tae Geun Kim2School of Electrical Engineering, Korea University, SeoulSchool of Electrical Engineering, Korea University, SeoulSchool of Electrical Engineering, Korea University, SeoulWe report the fabrication and optical characteristics of europium silicate thin films. Layer structures of Eu2O3/SiOX/Si (100) were deposited by an rf-sputtering method and annealed at 1100°C by rapid thermal annealing (RTA). Two methods were used for the deposition of SiOX layer: One was deposited by sputtering using SiO2 target (Ar gas at a rate of 50 sccm) and the other was deposited by reactive sputtering using Si target (Ar gas at a rate of 45 sccm, with an O2 gas at a rate of 5 sccm). Photoluminescence peak at 430 nm was observed in the sample composed of SiOx interlayer sputtered from SiO2 target. In comparison, PL peak at 570 nm was observed in the other sample, the SiOx layer of which was deposited by reactive sputtering from Si target. The compositional distributions of these samples were analyzed by X-ray photoelectron spectroscopy (XPS).http://www.ajstd.org/index.php/ajstd/article/view/195Sputteringphotoluminescencephotoelectron spectroscopy |
| spellingShingle | Young Chul Shin Eun Hong Kim Tae Geun Kim EUROPIUM SILICATE THIN FILMS FABRICATED BY RF MAGNETRON SPUTTERING AND THERMAL TREATMENT ASEAN Journal on Science and Technology for Development Sputtering photoluminescence photoelectron spectroscopy |
| title | EUROPIUM SILICATE THIN FILMS FABRICATED BY RF MAGNETRON SPUTTERING AND THERMAL TREATMENT |
| title_full | EUROPIUM SILICATE THIN FILMS FABRICATED BY RF MAGNETRON SPUTTERING AND THERMAL TREATMENT |
| title_fullStr | EUROPIUM SILICATE THIN FILMS FABRICATED BY RF MAGNETRON SPUTTERING AND THERMAL TREATMENT |
| title_full_unstemmed | EUROPIUM SILICATE THIN FILMS FABRICATED BY RF MAGNETRON SPUTTERING AND THERMAL TREATMENT |
| title_short | EUROPIUM SILICATE THIN FILMS FABRICATED BY RF MAGNETRON SPUTTERING AND THERMAL TREATMENT |
| title_sort | europium silicate thin films fabricated by rf magnetron sputtering and thermal treatment |
| topic | Sputtering photoluminescence photoelectron spectroscopy |
| url | http://www.ajstd.org/index.php/ajstd/article/view/195 |
| work_keys_str_mv | AT youngchulshin europiumsilicatethinfilmsfabricatedbyrfmagnetronsputteringandthermaltreatment AT eunhongkim europiumsilicatethinfilmsfabricatedbyrfmagnetronsputteringandthermaltreatment AT taegeunkim europiumsilicatethinfilmsfabricatedbyrfmagnetronsputteringandthermaltreatment |