Photoexcitation in thin films deposited on silicon substrates by reactive pulsed laser ablation
Reactive pulsed laser ablation is a very interesting method to deposit thin films of several materials and compounds such as oxides, nitrides, semiconductors and superconductors. This technique relies on photoablation of pure elements, or a mixture of materials, with simultaneous exposure to a react...
| Hauptverfasser: | , , , |
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| Format: | Artikel |
| Sprache: | English |
| Veröffentlicht: |
Wiley
2001-01-01
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| Schriftenreihe: | International Journal of Photoenergy |
| Online Zugang: | http://dx.doi.org/10.1155/S1110662X01000289 |