Study by X-ray diffraction of the residual stress produced during deposition of TiN thin films on metallic substrates

Study by X-ray diffraction of the residual stress produced during deposition of TiN thin films on metallic substrates

The influence of film thickness and the substrate type on the level and type of residual stresses generated on TiN coatings are analyzed. Two different physical vapor deposition (PVD) techniques: Magnetron Sputtering and Ion Plating were applied. Two materials were used as substrate: stainless stee...

Full description

Bibliographic Details
Main Authors: Mónica Monsalve, Esperanza López, Juan Meza, Fabio Vargas
Format: Article
Language:English
Published: Universidad de Antioquia 2010-01-01
Series:Revista Facultad de Ingeniería Universidad de Antioquia
Subjects:
X-ray diffraction
titanium nitride
thin films
residual stresses
Online Access:https://revistas.udea.edu.co/index.php/ingenieria/article/view/14162

Internet

https://revistas.udea.edu.co/index.php/ingenieria/article/view/14162

Similar Items