Surface Stoichiometry and Depth Profile of Ti<sub><i>x</i></sub>-Cu<sub><i>y</i></sub>N<sub><i>z</i></sub> Thin Films Deposited by Magnetron Sputtering

Surface Stoichiometry and Depth Profile of Ti<sub><i>x</i></sub>-Cu<sub><i>y</i></sub>N<sub><i>z</i></sub> Thin Films Deposited by Magnetron Sputtering

We report the surface stoichiometry of Ti<inline-formula><math xmlns="http://www.w3.org/1998/Math/MathML" display="inline"><semantics><msub><mrow></mrow><mi>x</mi></msub></semantics></math></inline-formula>-C...

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Bibliographic Details
Main Authors: Arun Kumar Mukhopadhyay, Avishek Roy, Gourab Bhattacharjee, Sadhan Chandra Das, Abhijit Majumdar, Harm Wulff, Rainer Hippler
Format: Article
Language:English
Published: MDPI AG 2021-06-01
Series:Materials
Subjects:
magnetron sputtering
Ti-Cu-N coating
N incorporation
X-ray photoelectron spectroscopy
X-ray diffraction
Transmission electron microscopy
Online Access:https://www.mdpi.com/1996-1944/14/12/3191

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https://www.mdpi.com/1996-1944/14/12/3191

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