Preparation and properties of TiN films under different sputtering pressure
In order to study the properties of TiN films, especially the infrared emission properties, TiN films were prepared by reactive DC magnetron sputtering under different sputtering pressures (0.1 Pa, 0.3 Pa, 0.5 Pa, 0.7 Pa) using Ti target as sputtering target, nitrogen as reaction gas and quartz glas...
| Main Authors: | , , , , |
|---|---|
| Format: | Article |
| Language: | zho |
| Published: |
Editorial Office of Journal of XPU
2023-04-01
|
| Series: | Xi'an Gongcheng Daxue xuebao |
| Subjects: | |
| Online Access: | http://journal.xpu.edu.cn/en/#/digest?ArticleID=1317 |