Carrier-transport-path-induced switching parameter fluctuation in oxide-based resistive switching memory

A key challenge in resistive switching memory is to reduce the switching parameter fluctuation, which always affects the stability and reliability of an RS device. Numerous methods have been carried out for improving the fluctuation of the switching parameter. However, because the physical nature of...

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Main Authors: Nianduan Lu, Ling Li, Pengxiao Sun, Ming Wang, Qi Liu, Hangbing Lv, Shibing Long, Writam Banerjee, Ming Liu
Format: Article
Language:English
Published: IOP Publishing 2015-01-01
Series:Materials Research Express
Subjects:
Online Access:https://doi.org/10.1088/2053-1591/2/4/046304
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author Nianduan Lu
Ling Li
Pengxiao Sun
Ming Wang
Qi Liu
Hangbing Lv
Shibing Long
Writam Banerjee
Ming Liu
author_facet Nianduan Lu
Ling Li
Pengxiao Sun
Ming Wang
Qi Liu
Hangbing Lv
Shibing Long
Writam Banerjee
Ming Liu
author_sort Nianduan Lu
collection DOAJ
description A key challenge in resistive switching memory is to reduce the switching parameter fluctuation, which always affects the stability and reliability of an RS device. Numerous methods have been carried out for improving the fluctuation of the switching parameter. However, because the physical nature of the switching parameter fluctuation is, to date, not well understood, a universal identification of the switching parameter fluctuation still has not be achieved. Based on the activation energy of carrier transport from the first-principles calculations, we present a physical model. This proposed model is considering the macroscopic fluctuating I–V curve and material microstructure to analyze the characteristics of carrier transport and the origin of switching parameter fluctuations. The proposed model may specially identify the defect energy level and quantify the distribution of the switching parameter. The model provides possible clues for improving the uniformity of the switching parameter as well.
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spelling doaj.art-445e7d512ed54f96abf2d18be756dde02023-08-09T15:20:04ZengIOP PublishingMaterials Research Express2053-15912015-01-012404630410.1088/2053-1591/2/4/046304Carrier-transport-path-induced switching parameter fluctuation in oxide-based resistive switching memoryNianduan Lu0Ling Li1Pengxiao Sun2Ming Wang3Qi Liu4Hangbing Lv5Shibing Long6Writam Banerjee7Ming Liu8Institute of Microelectronics, Chinese Academy of Sciences, No.3, Bei-Tu-Cheng West Road, Beijing 100029, People’s Republic of ChinaInstitute of Microelectronics, Chinese Academy of Sciences, No.3, Bei-Tu-Cheng West Road, Beijing 100029, People’s Republic of ChinaInstitute of Microelectronics, Chinese Academy of Sciences, No.3, Bei-Tu-Cheng West Road, Beijing 100029, People’s Republic of ChinaInstitute of Microelectronics, Chinese Academy of Sciences, No.3, Bei-Tu-Cheng West Road, Beijing 100029, People’s Republic of ChinaInstitute of Microelectronics, Chinese Academy of Sciences, No.3, Bei-Tu-Cheng West Road, Beijing 100029, People’s Republic of ChinaInstitute of Microelectronics, Chinese Academy of Sciences, No.3, Bei-Tu-Cheng West Road, Beijing 100029, People’s Republic of ChinaInstitute of Microelectronics, Chinese Academy of Sciences, No.3, Bei-Tu-Cheng West Road, Beijing 100029, People’s Republic of ChinaInstitute of Microelectronics, Chinese Academy of Sciences, No.3, Bei-Tu-Cheng West Road, Beijing 100029, People’s Republic of ChinaInstitute of Microelectronics, Chinese Academy of Sciences, No.3, Bei-Tu-Cheng West Road, Beijing 100029, People’s Republic of ChinaA key challenge in resistive switching memory is to reduce the switching parameter fluctuation, which always affects the stability and reliability of an RS device. Numerous methods have been carried out for improving the fluctuation of the switching parameter. However, because the physical nature of the switching parameter fluctuation is, to date, not well understood, a universal identification of the switching parameter fluctuation still has not be achieved. Based on the activation energy of carrier transport from the first-principles calculations, we present a physical model. This proposed model is considering the macroscopic fluctuating I–V curve and material microstructure to analyze the characteristics of carrier transport and the origin of switching parameter fluctuations. The proposed model may specially identify the defect energy level and quantify the distribution of the switching parameter. The model provides possible clues for improving the uniformity of the switching parameter as well.https://doi.org/10.1088/2053-1591/2/4/046304oxide-based resistive switching memoryfirst-principles calculationsswitching paramerter fluctuationcarrier transport path
spellingShingle Nianduan Lu
Ling Li
Pengxiao Sun
Ming Wang
Qi Liu
Hangbing Lv
Shibing Long
Writam Banerjee
Ming Liu
Carrier-transport-path-induced switching parameter fluctuation in oxide-based resistive switching memory
Materials Research Express
oxide-based resistive switching memory
first-principles calculations
switching paramerter fluctuation
carrier transport path
title Carrier-transport-path-induced switching parameter fluctuation in oxide-based resistive switching memory
title_full Carrier-transport-path-induced switching parameter fluctuation in oxide-based resistive switching memory
title_fullStr Carrier-transport-path-induced switching parameter fluctuation in oxide-based resistive switching memory
title_full_unstemmed Carrier-transport-path-induced switching parameter fluctuation in oxide-based resistive switching memory
title_short Carrier-transport-path-induced switching parameter fluctuation in oxide-based resistive switching memory
title_sort carrier transport path induced switching parameter fluctuation in oxide based resistive switching memory
topic oxide-based resistive switching memory
first-principles calculations
switching paramerter fluctuation
carrier transport path
url https://doi.org/10.1088/2053-1591/2/4/046304
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