Initial Growth and Crystallization Onset of Plasma Enhanced-Atomic Layer Deposited ZnO

Initial Growth and Crystallization Onset of Plasma Enhanced-Atomic Layer Deposited ZnO

Direct plasma enhanced-atomic layer deposition (PE-ALD) is adopted for the growth of ZnO on <i>c</i>-Si with native oxide at room temperature. The initial stages of growth both in terms of thickness evolution and crystallization onset are followed <i>ex-situ</i> by a combinat...

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Bibliographic Details
Main Authors: Alberto Perrotta, Julian Pilz, Roland Resel, Oliver Werzer, Anna Maria Coclite
Format: Article
Language:English
Published: MDPI AG 2020-04-01
Series:Crystals
Subjects:
zinc oxide
plasma atomic layer deposition
initial growth
Online Access:https://www.mdpi.com/2073-4352/10/4/291

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