Deposition of diamond films by microwave plasma CVD on 4H-SiC substrates

Deposition of diamond films by microwave plasma CVD on 4H-SiC substrates

Diamond films were deposited on 4H-SiC substrates by microwave plasma chemical vapor deposition (MPCVD). The substrate pretreatment method of electrostatic adsorption of seed crystals by nanodiamond suspensions was used, and the nucleation density of diamond on the substrate surface reached 10 ^10 /...

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Bibliographic Details
Main Authors: Shasha Wei, Renqi Xie, Yuanyou Li, Jiahao Meng, Rongchuan Lin, Jianchun Weng, Bo Li
Format: Article
Language:English
Published: IOP Publishing 2023-01-01
Series:Materials Research Express
Subjects:
microwave plasma CVD
4H-SiC
substrate pretreatment
diamond films
Online Access:https://doi.org/10.1088/2053-1591/ad094f

Internet

https://doi.org/10.1088/2053-1591/ad094f

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